发明名称 |
FOCAL PLANE ADJUSTED PHOTOMASK AND METHODS OF PROJECTING IMAGES ONTO PHOTOSENSITIZED WORKPIECE SURFACES |
摘要 |
<p>In the operation of a projection printer (11) photomasks (22), the patterns (21) of which are protected by coverplates (39), are used interchangeably with other photomasks, the patterns of which are located at an open surface thereof. The photomasks (22) feature shims (46) which space the patterns (21) away from a plane of support surfaces (13) of a mounting chuck (12) by a precise distance equal to the shift of the object plane (14) with respect to an image plane (17) because of the presence of the coverplate (39) in the optical path of the projection printer (11).</p> |
申请公布号 |
EP0179146(B1) |
申请公布日期 |
1988.09.21 |
申请号 |
EP19850902372 |
申请日期 |
1985.04.26 |
申请人 |
AMERICAN TELEPHONE AND TELEGRAPH COMPANY |
发明人 |
BANKS, EDWARD, LAWRENCE;ELLINGTON, THOMAS, SETTLE, IV;ZAVECZ, TERRENCE, EDWARD |
分类号 |
G03F1/64;G03F7/20;G03F7/207;G03F9/02;H01L21/027;H01L21/30;(IPC1-7):G03F1/00;G03B41/00 |
主分类号 |
G03F1/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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