发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a photosensitive resin compsn. having superior solubility and transparency and capable of forming a thick film by blending a photosensitive adduct comprising a polyimide precursor having prescribed repeating units and an isocyanate compd. having a prescribed structure, a photopolymn. initiator and an org. solvent or by further adding a polymerizable unsatd. compd. CONSTITUTION:A photosensitive adduct comprising a polyimide precursor having repeating units represented by formula I and an isocyanate compd. represented by formula II is blended with a photopolymn. initiator and an org. solvent. In the formula I, R1 is a quatervalent aliphat. or alicyclic group and R2 is a bivalent arom., alighat. or alicyclic group or an organosiloxane group. In the formula II, each of R3-R5 is H atom or methyl group and R6 is a bivalent hydrocarbon compd. group. A photosensitive resin compsn. having superior solubility and transparency and capable of forming a thick film can be obtd.
申请公布号 JPS63226639(A) 申请公布日期 1988.09.21
申请号 JP19870015609 申请日期 1987.01.26
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;HAYASHI NOBUYUKI;ISHIMARU TOSHIAKI
分类号 C08L79/08;C08G18/60;G03F7/027;G03F7/038 主分类号 C08L79/08
代理机构 代理人
主权项
地址