发明名称 VAPOR GROWTH METHOD
摘要 PURPOSE:To obtain an abrupt boundary in doping characteristics by introducing gas which does not contain reaction gases at least from two directions to the upstream side of a susceptor. CONSTITUTION:Gases which do not contain reaction gases are introduced from gas inlet tubes 22 of at least two directions to the upstream side of a susceptor 4. Accordingly, it can not only prevent a reaction substance from adhering to the upstream side of the susceptor 4 of a quartz furnace tube 2, but improve the disconnection of the gas in the tube 2. Thus, when the GaAs of an undoped layer, an N-type layer, a P-type layer, and an Al0.3Ga0.7As layer are continuously grown, the transition regions of the impurity, the composition in the boundaries are 20Angstrom or less to obtain an abrupt boundary with good reproducibility.
申请公布号 JPS63227009(A) 申请公布日期 1988.09.21
申请号 JP19870061546 申请日期 1987.03.17
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKAHASHI YASUHITO;MANOU MASAYA;HOSHINA JUNICHI
分类号 H01L21/205 主分类号 H01L21/205
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