| 摘要 |
<p>In a chemical vapour deposition apparatus having a perforated head (26) for ejecting reaction gas in a laminar flow over an object to be deposited, the head comprises an ejection member (27) ejecting the gas into the space inside the head in predetermined directions, a housing (33) enclosing the ejection member and guiding the gas ejected from the ejection member to flow over the inner surface thereof in a laminar state, and a perforated plate (34) connected to the bottom end of the housing, allowing the gas flowing centripetally over the inner surface thereof to be ejected outside the head. As a result, a laminar flow of homogeneous reaction gas is ejected toward the object, growing a chemical vapour deposition layer of high quality over the object.</p> |
