发明名称 VACUUM DEPOSITION METHOD
摘要 PURPOSE:To remove surely dust on a substrate by setting the substrate in a bell jar, evacuating the jar, and cleaning the surface of the substrate. CONSTITUTION:An Al drum (substrate) 3 is supported pivotally in a bell jar, and the rotation of the drum 3 is started. The jar is shut and evacuated. Cleaning brushes 6 in the jar stay at positions A away from the drum 3 until the inside of the jar attains to a prescribed degree of vacuum. When the inside of the jar attains to about 10<-6> Torr degree of vacuum, the brushes 6 are moved to positions B where they contact with the drum 3, and the brushes 6 are rotated to clean the drum 3. After finishing the cleaning, the rotation of the brushes 6 is stopped, and the brushes 6 are returned to the positions A. The drum 3 is then heated with electron beam guns 5, and an evaporating source 7 is heated to carry out vacuum deposition on the drum 3. It is required to exchange the brushes 6 each time a vacuum deposition stage is finished.
申请公布号 JPS59113176(A) 申请公布日期 1984.06.29
申请号 JP19820221986 申请日期 1982.12.20
申请人 RICOH KK 发明人 OOSETO SEIICHI
分类号 C23C14/02 主分类号 C23C14/02
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