发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE WITH REDUCED PACKAGING STRESS
摘要 A semiconductor device contains a stress-relief layer (46) having a glass transition temperature below 150 DEG C. The layer generally lies above an electrical interconnection system (12) in the device but does not overlie bond pad areas. This substantially alleviates thermally induced stress that could otherwise damage electronic components in the device while simultaneously allowing the maximum stress on electrical conductors (32 and 34) that protrude from the external package coating (48) to occur at bonding areas which can tolerate the stress. The layer is preferably made by lithographic patterning.
申请公布号 JPS63226046(A) 申请公布日期 1988.09.20
申请号 JP19870321185 申请日期 1987.12.18
申请人 PHILIPS GLOEILAMPENFAB:NV 发明人 MAIRON RARUFU KAGAN;DAGURASU FUREDERITSUKU RIDORII;DANIERU JIEIMUZU BERUTON
分类号 H01L21/56;H01L23/29;H01L23/31 主分类号 H01L21/56
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