发明名称 |
Process for preparing magnetic layer and magnetic head prepared using the same |
摘要 |
Ion implantation is conducted in a desired area(s) of the surface of a magnetic layer, and annealing of the layer is carried out to control the composition in that desired area(s). The control of the composition may be facilitated by applying a one-directional or rotating magnetic field during ion implantation. In preparing a magnetic head, a portion of a magnetic pole at least on one side thereof in close proximity to a magnetic recording medium is formed into an iron or iron-based magnetic alloy film, at least part of which is subjected to ion implantation and annealing.
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申请公布号 |
US4772976(A) |
申请公布日期 |
1988.09.20 |
申请号 |
US19850768965 |
申请日期 |
1985.08.23 |
申请人 |
HITACHI, LTD. |
发明人 |
OTOMO, SHIGEKAZU;KUMASAKA, NORIYUKI;IMURA, RYO;SUZUKI, RYO;SUGITA, YUTAKA |
分类号 |
G11B5/127;G11B5/147;G11B5/187;G11B5/21;G11B5/31;H01F41/18;(IPC1-7):G11B5/127 |
主分类号 |
G11B5/127 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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