发明名称 Process for preparing magnetic layer and magnetic head prepared using the same
摘要 Ion implantation is conducted in a desired area(s) of the surface of a magnetic layer, and annealing of the layer is carried out to control the composition in that desired area(s). The control of the composition may be facilitated by applying a one-directional or rotating magnetic field during ion implantation. In preparing a magnetic head, a portion of a magnetic pole at least on one side thereof in close proximity to a magnetic recording medium is formed into an iron or iron-based magnetic alloy film, at least part of which is subjected to ion implantation and annealing.
申请公布号 US4772976(A) 申请公布日期 1988.09.20
申请号 US19850768965 申请日期 1985.08.23
申请人 HITACHI, LTD. 发明人 OTOMO, SHIGEKAZU;KUMASAKA, NORIYUKI;IMURA, RYO;SUZUKI, RYO;SUGITA, YUTAKA
分类号 G11B5/127;G11B5/147;G11B5/187;G11B5/21;G11B5/31;H01F41/18;(IPC1-7):G11B5/127 主分类号 G11B5/127
代理机构 代理人
主权项
地址