Complementary metal oxide semiconductor integrated circuit with unequal reference voltages

摘要

A power supply voltage to be applied to a metallic connection 36a is supplied through an n+ diffusion region 34a, an N type well 22, an n+ diffusion region 34c and a metallic connection 36C to a p+ diffusion region 23b serving as a power supply line. An n+ diffusion region 73 serving as a ground line is grounded through a metallic connection 76c, a p+ diffusion region 74c, a P type well 72, a p+ diffusion region 74b and a metallic connection 76b.