| 摘要 |
PURPOSE:To prevent an electric charging to a product of primary electron without depositing the vapor of the metal by connecting a treating chamber in which a sample is provided to a discharging chamber through a plasma taking-out chamber and irradiating a sample surface by low temp. plasma. CONSTITUTION:If the treating chamber 4 made of glass and providing a biological sample 6 is pressed against a rubber packing 5 to connect an exhausting exit 3 of the discharging chamber 1 to a vacuum pump, the chamber 4 is connected to the chamber 1 by pressure difference with atmospheric pressure through the plasma taking-out chamber 9 provided with an annular plasma taking-out electrode 10. If inert gas is flowed into the chamber 1 from an inflow hole 2 in this state and capacity coupling type electrodes 71, 72 are excited by a high frequency source 8 under a desired vacuum degree, a plasma is generated in the chamber 1 by the discharge. Only a part of the plasma is taken out through the chamber 9 and the sample 6 is irradiated by the primary electron. The secondary electron is generated from the sample 6 without charging electrostatically the primary electron to the primary electron sample 6 and without depositing the vapor of the metal by this low temp. plasma, and the sample can be observed with high resolution. |
