| 摘要 |
PURPOSE:To enable easy washing of both faces of a semiconductor water by providing a plurality of sets of a pair of upper and lower washing brushes to wash both faces of the semiconductor wafer. CONSTITUTION:First, third and fifth roller brushes 1 and 2, 5 and 6, 9 and 10 for washing have the function of sending a semiconductor wafer 13 at a low speed, rotate at a low speed and second and fourth roller brushes rotate at a comparatively high speed since the surface of the wafer 13 is rubbed by the brushes. Each brush is provided with a nozzle 12 for washing the roller brush and the dust attached to the brush is washed by dropping a washing liquid. A washing nozzle 11 for the wafer is also provided between the brushes, the dust on the surface of the wafer is washed by dropping the washing liquid as with the nozzle 12 and the wafer 13 passes from left to right between the upper and the lower roller brushes one by one. Then, high temperature and dry air is blown by a water drying nozzle 14 on both the faces of the wafer, the wafer 13 is dried and a washing operation is finished.
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