发明名称 GAS LASER EQUIPMENT
摘要 PURPOSE:To prevent the deterioration of a gas, and improve the uniformity of ultra-violet ray radiation, by isolating an ultra-violet ray generating part from a main discharge gap with an ultra-violet ray transmission window, and applying electron cyclotron resonance discharge to a light emitting part. CONSTITUTION:A laser gas 2 is introduced between main electrodes 1 and 1', and excited by a main discharge power source 3. In order to generate uniform glow discharge in a main gap 4, ultra-violet rays generated by electrode cyclotron resonance discharge 7 are injected into the main gap 4, through holes 5 and ultra-violet ray transmission windows 6 arranged on the main electrode 1. The ultra-violet rays are made an incidence at the same time as the switch-on of the main power source 3 or a little before, in order to pre-excite the laser gas 2. As the laser gas is pre-excited by an ultra-violet ray source with excellent uniformity and large output, a gas laser with stabilized performance can be obtained.
申请公布号 JPS63224276(A) 申请公布日期 1988.09.19
申请号 JP19870055351 申请日期 1987.03.12
申请人 TOSHIBA CORP 发明人 MORIMIYA OSAMU;SUZUKI SETSUO;NODA ETSUO
分类号 H01S3/038;H01S3/097 主分类号 H01S3/038
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