| 摘要 |
PURPOSE:To form an iridium oxide film having a large area, without generating peeling of said film, by forming an metal film on discontinuous plural areas mounted on a transparent electrode, followed by subjecting an anodic oxidation. CONSTITUTION:The metallic iridium film 11 having such the broad area that does not generate the peeling of the film by the anodic oxidation is formed on the transparent electrode 12 by discontinously dividing said film into the plural areas, followed by subjecting the anode oxidation. The one sectional area of the metallic iridium film 11 which is discontinously formed in the plural areas changes according to the thickness of said film, but, is usually preferable to be about 1-5cm<2>. The whole area of the film is not specified, but, for exam ple, is preferably about 50-100cm<2> from the view point of a production appara tus. The working itself of subjecting the anodic oxidation to the metallic iridium film which is divided into the plural area, may be carried out by an ordinary technics. The anodic oxidation may be carried out by impressing a small chop ping wave voltage at the beginning of the oxidation, and then by impressing continuously it with the large amplitude.
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