| 摘要 |
PURPOSE:To stabilize microwaves and to decrease plasma, which intrudes into a depositing space, by providing a structure wherein activating chambers are formed so that resonant frequencies are provided for the microwaves for activating a precoursor and active species and the outer parts are formed of conductive networks. CONSTITUTION:Raw material gases A and B are introduced through pipes 1 and 2 and made to be a precoursor and active species in activating spaces 3 and 4. The precoursor and the active seeds are introduced into a depositing chamber 7, in which a substrate 8 is provided, through conductive networks 5 and 6. The spaces 3 and 4 are surrounded with waveguides 12 and 13 having termination parts 10 and 11 for adjusting resonant frequencies and cylindrical water-cooling applicators 14 and 15. Microwaves are introduced from microwave oscillators 16 and 17 through pipes 12 and 13. When plasma is yielded in the spaces 3 and 4, the resonant frequencies are fluctuated. Then the termination parts 10 and 11 are moved so as to correct the fluctuations, and the microwave discharge is stabilized. The networks 5 and 6 prevent the intrusion of the plasma into the chamber 7 and damage on the deposited film. |
