In a method of fabricating silicon X-ray masks, a silicon membrane is coated on both sides with a silicon nitride layer of suitable thickness and the regions in which optical transparency is to be obtained are defined with the aid of a suitable photolithographic procedure.
申请公布号
DE3707130(A1)
申请公布日期
1988.09.15
申请号
DE19873707130
申请日期
1987.03.03
申请人
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG EV
