发明名称 Using a rapid thermal process for manufacturing a wafer bonded soi semiconductor
摘要 A method of forming a high quality silicon on insulator semiconductor device using wafer bonding. The annealing time for the wafer bonding process is substantially reduced through the use of a rapid thermal annealer, thereby resulting in minimizing the redistribution of the doping concentration resulting from the annealing process.
申请公布号 US4771016(A) 申请公布日期 1988.09.13
申请号 US19870042135 申请日期 1987.04.24
申请人 HARRIS CORPORATION 发明人 BAJOR, GEORGE;RABY, JOSEPH S.
分类号 H01L21/20;H01L21/762;(IPC1-7):H01L21/20;H01L21/76 主分类号 H01L21/20
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