| 摘要 |
PURPOSE:To improve the accuracy of alignment by aligning and forming a plurality of insular marks having different width in the scanning direction onto a straight line. CONSTITUTION:A plurality of insular marks having different width in the scanning direction are aligned onto a straight line, and target marks 11A-11F on the surface of a wafer 1 are shaped. That is, the target marks 11A-11F on the surface of the wafer 1 are constituted of a plurality of the insular marks having different width in the scanning direction. An optical signal intenser than either of a plurality of the insular marks is acquired in such target marks 11A-11F, and the intense optical signal and alignment marks on the surface of a mask 2 can be compared. Accordingly, the accuracy of alignment is improved. |
