发明名称 PHOTOMASK
摘要 PURPOSE:To execute sticking with high accuracy and with high efficiency by forming a pattern for measuring a sticking position and sticking accuracy of a photomask use pellicle. CONSTITUTION:A pellicle use alignment mark 1 for measuring a sticking posi tion and sticking accuracy of a photomask use pellicle 3 is formed on a photomask 2. An allowable value (a) of the sticking accuracy of the photomask use pellicle 3 is set to, for instance, 0.3mum. In such a way, with respect to the photomask 2, the photomask use pellicle 3 can be installed easily in a correct position, and also, the sticking accuracy of the photomask use pellicle 3 can be measured. Especially, by placing several kinds of allowable values (a), the sticking accuracy can be measured more minutely.
申请公布号 JPS63220143(A) 申请公布日期 1988.09.13
申请号 JP19870053455 申请日期 1987.03.09
申请人 SEIKO EPSON CORP 发明人 ENDO TOSHIO;USHIYAMA FUMIAKI
分类号 G03F1/00;G03F1/38;H01L21/027 主分类号 G03F1/00
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