发明名称 |
POSITIVE TYPE RESIST COMPOSITION FOR ELECTRON RAY OR X-RAY |
摘要 |
PURPOSE:To improve resolving power and sensitivity by using a compsn. contg. a quinone diazide compd. and specific cresol-formaldehyde novolak resin at specific ratios. CONSTITUTION:This compsn. contains the quinone diazide compd. and the cresol-formaldehyde novolak resin. This resin is the cresol-formaldehyde novolak resin which is obtd.. by addition condensation of mixed meta-, para-cresols at a ratio of meta-cresol/para-cresol=20/80-60/40 (by weight) and formaldehyde and has 2,000-15,000 weight average mol.wt. The ratio of the quinone diazide compd. and the resin is in a 1:2-1:5 (by weight) range. The resist compsn. which is balanced in sensitivity and resolving power is thereby obtd. |
申请公布号 |
JPS63218947(A) |
申请公布日期 |
1988.09.12 |
申请号 |
JP19870052686 |
申请日期 |
1987.03.06 |
申请人 |
SUMITOMO CHEM CO LTD;NEC CORP |
发明人 |
HANABATAKE MAKOTO;FURUTA AKIHIRO;KAMIMURA YUKIKAZU;TANIGAKI KATSUMI;KITAKATA MAKOTO |
分类号 |
G03C1/72;G03C5/16;G03F7/023;G03F7/039;G03F7/20;H01L21/027 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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