METHOD FOR FORMING PATTERN OF DYEABLE RESIN FILM

摘要

PURPOSE:To obtain a pattern of high resolution by previously incorporating a nonionic surfactant into a dyeable photosensitive resin compsn. CONSTITUTION:A film is provided on the surface of a base material by using the dyeable photosensitive resin compsn. contg. a copolymer composed of a dyeable monomer, hydrophilic monomers except the dyeable monomer and hydrophobic monomer as a constituting component and is exposed by using a mask. The film is then developed by a developing soln. The nonionic surfactant is previously incorporated into the dyeable photosensitive resin compsn. The formation of the dyeable resin film pattern having the image of high resolution is thereby permitted.