POSITIVE TYPE RESIST COMPOSITION

摘要

PURPOSE:To improve the resolving power and sensitivity of a compsn. by using specified novolak resin and poly(2-methylpentene-1-sulfone). CONSTITUTION:The titled compsn. consists of alkali-soluble novolak resin represented by the formula and poly(2-methylpentene-1-sulfone). The blending ratio (m/m) between para-t-butylphenol and phenol as starting materials for the novolak resin is regulated to 20/80-40/60. The novolak resin is synthesized by bringing the above-mentioned starting materials and formaldehyde into addition condensation in the presence of an acid catalyst or the like. When the compsn. is used, a positive type resist film for electron beams or X-rays having high resolving power and high sensitivity is obtd.