发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To prevent a short circuit between leading-out electrodes by forming side walls consisting of an insulator to the second leading-out electrode and the side wall of a second insulating film prior to a pretreatment process. CONSTITUTION:Side walls 14 composed of an insulator are shaped to insulating films 4 and the side walls of a leading-out electrode 8 in the upper section of the insulating films 4 prior to pretreatment by an etchant. Consequently, the side etching of the insulating films 4 is prevented even through pretreatment by the etchant such as hydrofluoric acid (HF) group one prior to the silicide- forming process of the leading-out electrode. Accordingly, even when the surfaces of leading-out electrodes 3, 8 are converted into silicide in a postprocess, a short circuit between both electrodes 3, 8 due to the cubical expansion of the electrodes is prevented.
申请公布号 JPS63217663(A) 申请公布日期 1988.09.09
申请号 JP19870051412 申请日期 1987.03.06
申请人 FUJITSU LTD 发明人 YAMAUCHI TSUNENORI;INAYOSHI KATSUYUKI
分类号 H01L29/73;H01L21/331;H01L29/72;H01L29/732 主分类号 H01L29/73
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