发明名称 RUGGED PLATING METHOD
摘要 PURPOSE:To uniformly form an rugged plated layer having superior adhesion on a body to be plated, by periodically reversing the positive and negative polarities of a pair of copper electrodes in an electrolytic circuit formed separately from an electrolytic circuit for rugged copper plating. CONSTITUTION:A copper sulfate plating soln. 9 contg. Cl<-> at a low concn. and a polyoxyethylene surfactant is used for plating. The surfactant forms a complex of C<+> and the Cl<-> contributes toward forming a moderately uneven plated copper layer. When an insoluble anode 18 is used for plating with the plating soln. 9, a large amt. of O2 is generated from the surface of the anode by the electrolysis of water to oxidize Cu<+> to Cu<2+> and the concn. of Cu<+> becomes insufficient. In order to increase the concn. of Cu<+>, electrolysis is carried out with a second electrolytic circuit 28 provided with a pair of copper electrodes 32 and formed separately from a first electrolytic circuit for rugged copper plating in the plating soln. 9. Thus, an rugged plated layer 6 of high quality is obtd.
申请公布号 JPS63216992(A) 申请公布日期 1988.09.09
申请号 JP19870048172 申请日期 1987.03.03
申请人 MATSUSHITA REFRIG CO 发明人 INATANI MASATOSHI
分类号 C25D5/16;C25D3/38;C25D7/00 主分类号 C25D5/16
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