| 摘要 |
PURPOSE:To prevent the deterioration of the image quality due to bias drop, and electrode effect of excess and deficient electrification, and to improve the carrying characteristics of a developer by forming an org. polymerized film on a cylinderical substrate in a rigged linear state by a glow discharge decomposing method of a gaseous specific compd. in a vacuum atmosphere. CONSTITUTION:The org. polymerized film is formed on the cylinderical aluminum substrate 752 by making the inside of a reaction chamber 733 in a coating layer manufacturing device into a high vacuum and feeding gaseous fluoroalkylsilane in said reaction chamber, and subjecting to a plasma polymerization reaction. The rigged linear surface is formed on the substrate by transferring the substrate to an electron beam depositing device and forming a latent image on the substrate and transferring again the obtd. substrate to the coating layer manufacturing device followed by plasma-etching. Since the content of a fluorine atom contd. in the polymerization film is 0.1-35atom.%, the friction- resistance of the titled member to an another member is increased. The deterioration of the image quality due to the bias drop, and the electrode effect of the excess and deficient electrification is prevented, and the carrying characteristics of the developer of the titled member is improved. |
