| 摘要 |
Photoetching organic biological matter is effected without requiring heat as the dominant etching mechanism. Farultraviolet radiation having one or more of wavelengths less than 200 nm is used to selectively remove organic biological material, where the radiation has an energy fluence sufficiently great to cause ablative photodecomposition i.e. bond-breaking and resulting generation of volatile or gaseous products which "explode" away from the irradiated material. Either continuous wave or pulse radiation can be used, a suitable ultraviolet light source being an ArF excimer laser having an output at 193 nm. The exposed biological material is ablatively photodecomposed without heating or damage to the rest of the organic material. Medical and dental applications include the removal of damaged or unhealthy tissue from bone, removal of skin lesions, cutting or sectioning healthy tissue, and the treatment of decayed teeth. |
