| 摘要 |
PURPOSE:To improve sensitivity to radiant rays of an inorg. resist material based on a peroxy condensed tungstic acid by incorporating a peroxy condensed acid contg. W and Ta into the inorg. resist material. CONSTITUTION:The material of this invention is obtd. by mixing a soln. of peroxy condensed tantalic acid obtd. by a reaction of aq. H2O2 with alcoholic soln. of ethoxy tantalum, with a soln. of peroxy condensed tungstic acid. The material can form uniform thin film by wet coating, and has high resistance to oxygen plasma. Moreover, the sensitivity to ultraviolet rays, electron beams, and X-rays is enhanced by the addition of Ta. By this material, formation of an inorg. thin resists film having high sensitivity is possible by a convenient and inexpensive wet coating process. |
