发明名称 |
PRODUCTION OF FLUORIDE GLASS |
摘要 |
PURPOSE:To facilitate the removal of oxides or hydroxides from fluoride glass by making an activated reaction gas by introducing a reaction gas containing halogen or halide into a plasma atmosphere and bringing the activated reaction gas into contact with the heat-melted part of the fluoride glass. CONSTITUTION:Fluoride glass 1 is charged in a crucible 2 placed inside the cylindrical reactor tube 3 and the inside of the reactor tube 3 is filled with dried argon. Then, the fluoride glass 1 is melted by heating with a high frequency heating coil 5. In the meantime, a reaction gas containing halogen such as fluorine or a halide such as carbon tetrachloride is introduced into the plasma atmosphere in the reaction furnace 91 of the plasma generator 9 and activated. Then, the activated reaction gas is brought into contact with the heat-melted part of the fluoride glass 1 to remove hydroxides and oxides from the glass and give purified fluoride glass.
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申请公布号 |
JPS63215523(A) |
申请公布日期 |
1988.09.08 |
申请号 |
JP19870049069 |
申请日期 |
1987.03.04 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HIRAI SHIGERU;CHIGUSA YOSHIKI |
分类号 |
C03B5/225;C03B5/02;C03B8/00;C03C3/32;C03C4/10 |
主分类号 |
C03B5/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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