发明名称 PRODUCTION OF FLUORIDE GLASS
摘要 PURPOSE:To facilitate the removal of oxides or hydroxides from fluoride glass by making an activated reaction gas by introducing a reaction gas containing halogen or halide into a plasma atmosphere and bringing the activated reaction gas into contact with the heat-melted part of the fluoride glass. CONSTITUTION:Fluoride glass 1 is charged in a crucible 2 placed inside the cylindrical reactor tube 3 and the inside of the reactor tube 3 is filled with dried argon. Then, the fluoride glass 1 is melted by heating with a high frequency heating coil 5. In the meantime, a reaction gas containing halogen such as fluorine or a halide such as carbon tetrachloride is introduced into the plasma atmosphere in the reaction furnace 91 of the plasma generator 9 and activated. Then, the activated reaction gas is brought into contact with the heat-melted part of the fluoride glass 1 to remove hydroxides and oxides from the glass and give purified fluoride glass.
申请公布号 JPS63215523(A) 申请公布日期 1988.09.08
申请号 JP19870049069 申请日期 1987.03.04
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HIRAI SHIGERU;CHIGUSA YOSHIKI
分类号 C03B5/225;C03B5/02;C03B8/00;C03C3/32;C03C4/10 主分类号 C03B5/225
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