| 摘要 |
PURPOSE:To quickly execute a relative alignment operation between a mask and a substrate during a pattern transcription process by using a step-and-repeat method, by a method wherein a photoelectron-emitting face in a region to form an alignment pattern is irradiated by using a light source which is different from another light source to irradiate the photoelectron- emitting face in another region to form a pattern to be transcribed. CONSTITUTION:An electric field and a magnetic filed parallel to the electric field are impressed on a space between a photoelectron-emitting, face 7, which adheres closely to a mask 2 where a pattern to be transcribed and two or more alignment patterns 5 are arranged at the circumference of the pattern, and a substrate 4 arranged to be face to face with the emitting face; the photoelectron-emitting face 7 is irradiated with a beam of light; the pattern to be transcribed is transcribed onto the substrate 4 by using photoelectrons emitted from the photoelectron-emitting face 7. At this photoelectron-applied transcription method, a photoelectron-emitting face 71 in a region where the alignment patterns 5 are formed is irradiated selectively with beams of light 8, 81 from a light source which is different from another light source which irradiates the photoelectron-emitting face 7 situated in a region 200 where the pattern to be transcribed is formed; an alignment operation between the mask 2 and the substrate 4 is executed by using photoelectrons 9 which are emitted from the photoelectron-emitting face 71.
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