| 摘要 |
PURPOSE:To automatically take out the information on the position of drawing at the time of occurrence of an electric discharge when the electric discharge to disturb the action of an electrostatic lens takes place during the drawing, by a method wherein a discharge-detecting circuit or the like is installed in such a way that the circuit detects a discharge current between electrostatic electrodes constituting the electrostatic lens and generates a response signal when the discharge current exceeds a reference valve. CONSTITUTION:The following three are installed: a means to converge a charged-particle beam by using electrostatic lenses 3, 5; a means 6 to deflect the charged-particle beam in order to control the position of a material 7 to be irradiated with the converged charged- particle beam; a material-shifting means 8 in order to shift the position of the material 7. While the information on the position to be irradiated with the charged-particle beam is being given to the charged-particle beam deflecting means 6 or to the material-shifting means 8, a prescribed patter is drawn on the material 7. This charged-particle lithography device is provided with discharge-detecting circuits 12, 13, which detect a discharge current between electrostatic electrodes 3a-3c and 5a-5c constituting the electrostatic lenses 3, 5 and generate a response signal when the discharge current exceeds a reference value, and means 19-22, which take out the information on the position of the material 7 to be irradiated with the charged-particle beam at the occurrence of an electric discharge on the basis of said response signal.
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