发明名称 METHOD FOR TREATING PHOTOSENSITIVE PLANOGRAPHIC PLATE
摘要 PURPOSE:To simplify the processing step and to eliminate or reduce labor by forming a printout image by image-wisely exposing, followed by applying an erasing solution to an unnecessary image part, and by supplying a developer which is substantially unused, to each photosensitive planographic plate to be treated, followed by developing said plate. CONSTITUTION:The exposed PS plate P is previously applied the erasing solution to the unnecessary image part, and carried in the direction of the arrow (a) by means of pair of the carrying rollers 1-3, 3'. The developer is supplied to the surface of the plate sent to the developing part on a guide plate 4 by pair of rollers 1, from developer pipes 5, 5'. At the same time, the surface of said plate is developed, while rubbing said surface by the rubbing members 6, 6' provided with a nylon brush as development promoting operation. Said developer is the substantially unused developer, and is stored in a developing tank 7, and supplied to the plate by a pump 8. Thus, the processing step is simplified, and the labor is eliminated or reduced, and the developing of the titled plate is stably carried out.
申请公布号 JPS63210842(A) 申请公布日期 1988.09.01
申请号 JP19870044763 申请日期 1987.02.26
申请人 KONICA CORP 发明人 KIYONO MINORU;UEHARA MASABUMI;NAKANO MIEJI;NOGAMI AKIRA
分类号 G03C7/00;G03F7/00;G03F7/30 主分类号 G03C7/00
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