| 摘要 |
PURPOSE:To form a thin magnetic film having superior magnetic properties, by using, as a target, a Co-base alloy reduced in contents of impurities such as oxygen, nitrogen, etc., and containing specific amounts of Ca and groups IVa and Va elements at the time of manufacturing a thin film as a magnetic recording material by means of sputtering. CONSTITUTION:As a target at the time of manufacturing a magnetic recording material by vapor-depositing a thin film of magnetic alloy onto a nonmagnetic substrate by means of sputtering, a Co-base alloy containing, by weight, 40-95% Co, 3-30% group-IVa element such as Ti, Zr, Hf, etc., 5-30% group-Va element such as Nb, Ta, etc., <10-200ppm Ca, and <200ppm O2 and <50ppm N2 as impurities is used. By the addition of Ca, the alloy is made clean and gettering action is provided, together with Ti, Zr, and Hf, so that magnetic vapor deposition film of Co-base alloy having high purity and excellent in magnetic properties and stability can be formed.
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