发明名称 PRODUCTION OF GASEOUS SILANE
摘要 PURPOSE:To obtain gaseous silane stably, in high yield and with high controllability of reaction, by carrying out a disproportionation reaction of trialkoxysilane in gaseous phase using at least one kind selected from a simple substance of a metal, supported metal on active carbon, and active carbon, as catalyst. CONSTITUTION:Gaseous silane is obtd. by carrying out a disproportionation reaction of alkoxysilane (e.g. trimethoxysilane) expressed by the formula (wherein R<1>, R<2>, R<3> are 1-3 alkyl) at 100-500 deg.C in gaseous phase using at least one kind selected from a simple substance of a metal, simple substance of a metal supported in active carbon, and active carbon, as catalyst. Specific examples for the simple substance of the metal are Mg, Ti, Mn, Ni, Cu, Pd, Pt, etc. By this constitution, the control of the disproportionation is facilitated, particularly, and the reaction can be stopped immediately at emergency by stopping the feed of trialkoxysilane to a reaction tube.
申请公布号 JPS63210013(A) 申请公布日期 1988.08.31
申请号 JP19870043701 申请日期 1987.02.26
申请人 CHISSO CORP 发明人 INABA SHINICHI;NAGAHAMA HIDEKI
分类号 C01B33/04;B01J21/06;B01J21/10;B01J23/02;B01J23/34;B01J23/44;B01J23/72;B01J23/74;B01J23/755 主分类号 C01B33/04
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