| 摘要 |
PURPOSE:To increase the quantity of lithographed objects processed in a unit period by making respective electron beam lithography system connectable to any one of a plurality of buffer memories. CONSTITUTION:Because the electron beam control signal generators 2a and 2b of a plurality of electron beam lithography systems A and B can be connected to any one of a plurality of buffer memories M1 M4, operations of lithographying different types of patterns in a plurality of respective element forming regions of respective lithographed objects 9a and 9b in a plurality of the electron beam lithography systems A and B can be performed continuously without creating a waiting time for transferring lithography data from a lithography data storage 1 to a plurality of the buffer memories M1-M4 by switching the connections of the electron beam control signal generators 2a and 2b to a plurality of the buffer memories M1 M4 so as not to compete against each other and, at the same time, by controlling the order of lithography of a plurality of the element forming regions in the lithographed objects 9a and 9b properly. With this constitution, the quantity of the lithographed objects subjected to an exposure process by electron beam lithography in a unit period can be increased.
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