| 摘要 |
PURPOSE:To effectively prevent the cracking of a resist material during development by incorporating a phenyl or biphenyl deriv. having at least one hydroxyl group into the resist material. CONSTITUTION:A phenyl or biphenyl deriv. having at least one hydroxyl group is incorporated into the naphthoquinonediazidosulfonic ester of novolak resin as a resist material by 0.01-1.0wt.% of the amt. of the ester. Thus, the cracking of the resist material after coating and during development can be prevented. |
