发明名称 METHOD AND APPARATUS FOR MANUFACTURING THIN FILM BY PHOTO-CVD
摘要 PURPOSE:To prevent a window for introducing 'light' from clouding by holding a substrate at a temperature in which reactive gas is adhered in a liquid or solid state to the substrate under the condition in a reaction chamber, and holding it at a temperature lower than that of the 'window'. CONSTITUTION:The temperature of a substrate is held at relatively low temperature, generally below zero degree, reactive gas is thereby solidified or liquefied on the substrate. Simultaneously, the temperature of the substrate is held at lower temperature than that of a 'window'. Thus, high density reactive gas exists on the substrate, and low density reactive gas exists relatively on the 'window' 6 and in a reaction chamber 1. Accordingly, a 'light' is radiated in this state to conduct a photo-CVD. That is, the substrate is held at the temperature or lower in which the gas is adhered onto the substrate in a solid or liquid state in the chamber 1 and at lower temperature than that of the 'window' 6. It can prevent the inner surface of the 'window' 6 from clouding.
申请公布号 JPS63207121(A) 申请公布日期 1988.08.26
申请号 JP19870039889 申请日期 1987.02.23
申请人 NIKON CORP 发明人 KATSURAI KUMIKO;NIWA TATSUO
分类号 H01L21/205;H01L21/263 主分类号 H01L21/205
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