| 摘要 |
PURPOSE:To prevent detrimental dust from generating and to stabilize mechanical holding capacity of a plasma processor by using a supporting rod for supporting a wafer mounting electrode both as a support and as a power supplying unit to supply a plasma exciting power. CONSTITUTION:Many wafer mounting electrode plates 8 for generating a plasma provided with many wafers 2 in a sealed vessel reaction tube 1 are conveyed by a supporting rod 14 having a conductive material electrically connected to the plates 8. A voltage is applied through the rod 14 to the plates 18 to generate plasma, thereby plasma processing it. A plasma exciting power is supplied from the rod 14 to the plates 8 to statically connect the plates 18 to the rod. Thus, it prevents detrimental dust from generating and stabilizes mechanical holding capacity.
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