POSITIVE TYPE PHOTOSENSITIVE HEAT RESISTANT MATERIAL

摘要

PURPOSE:To permit development with an aq. alkali soln. and fine working by direct light with high accuracy and high resolution and to enhance preservable stability by using a polymer having the repeating unit of the structure expressed by the prescribed formula. CONSTITUTION:The polymer having the repeating unit of the structure expressed by the formula is used. In the formula, R<1> denotes a divalent org. group; R<2> denotes a residual group of phenyl deriv. having a nitro group in the ortho position; R<3> denotes a residual group of tetracarboxylic dianhydride contg. 2 carbon atoms.; R<4> denotes a monovalent org. group; R<1>-R<4> of different kinds and the same kind are equally usable. R<2> is bonded to the polymer via the amide bond. This amide bond part is easily decomposed to form the carboxylic acid when irradiated with visible rays, by which the exposed part of the polymer is converted to the polyamic acid and is provided with the easy solubility in the aq. alkali soln.