发明名称 FE-SI-BASE ALLOY FOR VAPOR DEPOSITION
摘要 PURPOSE:To produce an Fe-Si-base alloy for vapor deposition which is adequate for forming a thin film to be used as a magnetic recording material by incorporating specific ratios of Si, Al, Ti, Ca, O, S, and N into Fe. CONSTITUTION:The Fe-Si-base alloy contg. 2.5-10wt.% Si, 0.005-0.5wt.% Al, and/or <=0.5wt.% Ti, 10-100ppm Ca, <=50ppm, more preferably <=20ppm O, <=20ppm, more preferably <=10ppm S, <=30ppm, more preferably <=10ppm N and consisting of the balance substantially Fe is prepd. Other impurities in the alloy are decreased as far as possible and are, for example, confined to about <=0.005% Mn and about <=50ppm P. The Fe-Si-base alloy useful as the material for producing the thin film of the magneto-optical recording material is thereby obtd.
申请公布号 JPS63206466(A) 申请公布日期 1988.08.25
申请号 JP19870039530 申请日期 1987.02.23
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 DEGAWA TORU;UCHIDA YOSHIHISA
分类号 C23C14/24;C22C38/00;C23C14/14;C23C14/34;H01F1/14 主分类号 C23C14/24
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