发明名称 SPUTTER ION PUMP
摘要 PURPOSE:To miniaturize a sputter ion pump as well as to secure a high vacuum chamber, by forming a cathodic electrode and an anodic electrode both into ring form, while forming a permanent magnet into ring form as well, and setting the center and its vicinity of a vacuum vessel down to an exhausted space. CONSTITUTION:A vacuum vessel 1 is formed into cylindrical form, and cathodic electrodes 2 and 3 and an anodic electrode 4 are all formed into ring form so as to be housed inside this vacuum vessel. Corresponding to form of these cathodic electrodes 2 and 3 and the anodic electrode 4, permanent magnets 5 and 6 are formed into ring form as well. The center and its vicinity of this cylindrical vacuum vessel 1 is set down to an exhausted space. Evacuation is carried out by ion pump action and chemisorption action. Thus, a high vacuum is realizable with a small device.
申请公布号 JPS63205475(A) 申请公布日期 1988.08.24
申请号 JP19870035888 申请日期 1987.02.20
申请人 FUJITSU LTD 发明人 ITO AKIO;ISHIZUKA TOSHIHIRO;OZAKI KAZUYUKI;OKUBO KAZUO;GOTO YOSHIAKI
分类号 F04B37/16;F04B37/02;H01J41/20 主分类号 F04B37/16
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