| 摘要 |
PURPOSE:To permit formation of filter layers having flattened surface by forming the filter layers on recesses and projecting parts in a manner as to substantially eliminate steps on the surface of the filter layers, then etching the entire surface until the projecting parts are exposed. CONSTITUTION:An acrylic resin or the like is deposited on a substrate 11 and is cured to form the flattened layer 12a to flatten the ruggedness in the recesses and projecting parts of the substrate 11 which is a solid state image pickup element. A photoresist is then coated thereon and is patterned by exposing and developing to form an intermediate layer 12b. The projecting parts (intermediate layer 12b) and the recesses (the parts where the intermediate layer 12b is removed by the patterning) are thus provided. A previously colored acrylic resin or the like is thickly coated on the intermediate layer 12b and the flat layer 12a to flatten the surface thereof and is cured to form the 1st filter 13. Dry etching is then executed until the intermediate layer 12b is exposed to form the filter to a prescribed thickness. The surfaces of the respective filter layers are thereby flattened. |
