| 摘要 |
An electron beam tester for fault detection and isolation in large and very large scale integrated circuits. An electron optical column focuses a primary beam of electrons on the surface of a circuit chip. An immersion extractor provides an electrical field to attract secondary electrons emitted from the irradiated surface. Secondary electrons are detected in an integral spectrometer. A wide bore final lens and integral high resolution double defection scan coils enable large area voltage contrast imaging as well as quantitative waveform measurement from internal nodes of the circuit chip.
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