| 摘要 |
<p>PURPOSE:To simplify manufacturing process and ensure long life, power consumption and high speed printing by forming a thermal resistor and a protective layer using the same composition. CONSTITUTION:For instance, a Mo-SiO2 thermal resistor film with a thickness of 3,000-4,000Angstrom is formed, by means of high-frequency dipolar sputtering, on a glazed alumina substrate 9 in, for instance, an Ar atmosphere of pressure 4X10<-3>Pa. Al is allowed to adhere to the surface of the resistor film, in the thickness of 1-2mum, and subjected to selective etching to form, for instance, a thermal head pattern of seven thermal heads/mm. On this, Mo-SiO2 having a different composition from a thermal resistor 8 is sputtered in the thickness of 5mum as a protective layer 6 to complete the formation of a thermal head. In this way, only one kind of filming material is used for the thermal resistor 8 and protector 6 and only a single specification is required for filming. At the same time, filming time is reduced and the thermal head capable of long life, power consumption and high-speed printing is obtained.</p> |
