| 摘要 |
PURPOSE:To obtain optimum photoconductive characteristics to the rays of light in an optical wavelength region by using superlattice structure obtained by alternately laminating thin layers different in optical band gap from each other for a photoconductive layer and properly combining materials for forming the thin layers. CONSTITUTION:An electrophotographic sensitive body is obtained by successively laminating on a conductive substrate 1 a blocking layer 2, the photoconductive layer 3 composed of an electric charge holding layer 5, and a charge generating layer 6, and on this layer 6 a surface layer 4. Each of the layers 5, 6 has superlattice structure, and the layer 6 is constituted by alternately laminating thin films of amorphous silicon and thin films of microcrystalline silicon, the layer 5 is constituted by alternately laminating thin films of amorphous silicon and thin films of amorphous silicon containing at least one of C, O, and N, and the concentration of said element is changed in the film thickness direction in each thin film, thus permitting the obtained electrophotographic sensitive body to be superior in electrification characteristics, dark attenuation resistance and photosensitive characteristics, and superior in resistance to environmental conditions or the like. |
