COPOLYMER HAVING O-NITROCARBINOL ESTER, DOUBLE-LAYER RESIST USING THE SAME AND PRODUCTION OF SEMICONDUCTIVE ELEMENT

摘要

Copolymers useful in particular for producing two-layer resists and fabricating semiconductor devices contain from 5 to 50 mol % of monomers having o-nitrocarbinol ester groups, from 95 to 50 mol % of an olefinically unsaturated silicon-containing organic compound, from 0 to 20 mol % of an olefinically unsaturated carboxylic acid and from 0 to 25 mol % of other copolymerizable monomers.