| 摘要 |
The proposed high-frequency ion source has an electrically insulating plasma discharge pot (9) whose surface is charged positively and thus prevents sputtering of the inner wall. The vapour to be ionised or the gas to be ionised is supplied through holes or slots. The discharge pot (9) is surrounded by a high-frequency induction coil (6) which can be cooled. During operation of the ion source, there is no discharge between the plasma discharge pot (9) and the inner wall (2) of the discharge chamber. The extracted ions are accelerated to the desired energy by the triple or multiple extraction system which can be cooled by a cooling medium. The ion source is maintenance-free, has an unlimited operating time since no sputtering effects occur and no consumable parts, such as hot cathodes for example, are required for operation. The ion beam is absolutely free of undesired impurities. The operating pressure range in which the ion source is intended to be operated can be determined by the frequency and the dimensions of the plasma discharge pot (9) and of the discharge chamber. <IMAGE>
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