发明名称 REACTION TUBE FOR REDUCED PRESSURE THERMAL TREATMENT DEVICE
摘要 PURPOSE:To obtain a reaction tube which is not crushed by heating under a negative pressure and allows heaters to get near wafers by arranging a pair of partition plates in parallel at least in a reaction tube that is in the form of a flat cylinder and by causing a gas to pass through an area that is interposed between the partition plates. CONSTITUTION:A reaction tube 1 that is made of transparent silica and is in the form of cylinder having an oval cross section has a rectangular flange 12 around an opening part and is sealed by a lid 8. A tail tube 4 is prepared at the other end. A pair of partition plates 2 and 3 made of transparent silica is provided in parallel after interposing a center line of the broadening direction at a cross section of the reaction tube 1 between two partition plates and their partition plates prevent the deformation of its pipe due to heat treatment under reduced pressure. One end of respective partition plates 2 and 3 is fixed at internal walls of an end cover 14 and other end of them makes a cavity 13a between a plane of the flange 12 and the ends of the plates and then its cavity permits a reaction gas to be easily introduced into space interposed between the partition plates and further a holdup gas in the spaces 1B and 1C to be exhausted from the opening 13b that is prepared in the vicinity of the tail tube 4. Infrared ray lamps 6 are arranged on the outside of the pipe and the flange 12 is sealed by the lid 8 and then a purge gas is introduced from a tube 9. This configuration allows heaters 6 to get near wafers 7 and the adaptable reaction pipe which is not crushed by heating even under a negative pressure is obtained.
申请公布号 JPS63200526(A) 申请公布日期 1988.08.18
申请号 JP19870032319 申请日期 1987.02.17
申请人 SHINETSU SEKIEI KK 发明人 KIMURA HIROSHI
分类号 H01L21/31;H01L21/205;H01L21/22;H01L21/26 主分类号 H01L21/31
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