发明名称 CHARGED-BEAM LITHOGRAPHY METHOD
摘要 PURPOSE:To remove fundamental figures including undersize sides, to reduce the generation of drawing unit figures to be turned to undersize figures and to improve the precision of a drawing pattern by joining and processing the fundamental figure including the undersize side with adjacent another fundamental figure, dividing the joined fundamental figure and forming a new fundamental figure. CONSTITUTION:A fundamental figure in which a pattern to be shaped is divided is divided into drawing unit figures capable of being formed by a beam molding means with two or more of apertures, and a desired pattern is drawn as the assembly of the drawing unit figures. In such a drawing method, the pattern to be formed is partitioned by segments parallel with the X or Y direction passing through the apex of the pattern and fundamental figure groups 77a-77g are shaped, and fundamental figures 53, 54 in which the fundamental figures 77c, 77e containing undersize sides are joined with adjacent other fundamental figures are divided by segments parallel with the Y or X direction opposite to said dividing segments passing through the apices of the figures 53, 54 and novel fundamental figures are shaped when there are undersize sides less than minimum length allowable as one sides of the drawing unit figures in one sides of virtual rectangles circumscribed with each fundamental figure.
申请公布号 JPS63199421(A) 申请公布日期 1988.08.17
申请号 JP19870032718 申请日期 1987.02.16
申请人 TOSHIBA CORP 发明人 IKENAGA OSAMU;WATANABE SUSUMU
分类号 H01L21/027;H01J37/302;H01J37/317 主分类号 H01L21/027
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