发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To measure the position of a substrate stage to a mask placed on a carriage accurately at all times without being affected by the positional factor of the carriage by mounting a laser interference generating section for detecting displacement in at least two directions onto a scanning means scanning an original plate and a body to be exposed to an exposure means. CONSTITUTION:A laser interference generating section 16 for detecting displacement in at least two directions of an original plate 1 or a body to be exposed 3 is set up onto a scanning means relatively scanning the original plate 1 and the body to be exposed 1 to an exposure means. Beams from a laser tube 14 are reflected by a mirror 33, and divided by a half mirror 22a, and reflected beams are directed toward an interference section 16a for detecting displacement in the X direction. Transmitting beams are divided by a half mirror 22b through a mirror 23a, and reflected beams are directed toward an interference section 16b for detecting displacement in the Y direction. Transmitting beams are projected to an interference section 16c for detecting displacement in the thetadirection through a mirror 23b. A detector 20 detects the change of intensity of beams, and displacement in each direction and a current position are computed by CPU 30.
申请公布号 JPS63199417(A) 申请公布日期 1988.08.17
申请号 JP19870031862 申请日期 1987.02.14
申请人 CANON INC 发明人 ISOHATA JUNJI;YAMAMOTO SEKINORI;MATSUSHITA KOICHI
分类号 G03F9/00;G03F7/20;G12B5/00;H01L21/027;H01L21/30;H01L21/68 主分类号 G03F9/00
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