发明名称 MOLDING OF GRANULAR PATTERN
摘要 <p>PURPOSE:To enable a granular pattern to be simply and surely formed on a synthetic resin product by molding a back resin layer on the undersurface of a base resin, while injection molding the mixture of the base resin with the granular resin. CONSTITUTION:Since granular resin 3 is in a softened state when it is injected from a gate with the base resin being in molten state, it may easily pass through a gate by the deformation thereof even when the diameter of the particle is larger than that of the gate hole. After the granular resin has been injected into a mold, the particle is restored to its original shape, and a granular pattern is formed. Further, a back resin layer 4 is molded, and since its color is set so as to give a striking contrast to the color of the granular resin 3, the decorative effect can be effectively displayed.</p>
申请公布号 JPS63197615(A) 申请公布日期 1988.08.16
申请号 JP19870029426 申请日期 1987.02.10
申请人 YOSHINO KOGYOSHO CO LTD 发明人 SHIMADA SHINJI
分类号 B65D1/00;B29C45/00;B29C45/16;B29K501/12;B29L31/56;B65D1/09 主分类号 B65D1/00
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