发明名称 Semiconductor integrated circuit device and method of manufacturing the same
摘要 A semiconductor integrated circuit device, especially an EPROM (Electrically Programmable Read Only Memory) device which consists of an MIS type memory transistor portion having a floating gate electrode and a control gate electrode on said floating gate electrode, and of an MIS type transistor portion having a gate electrode is formed by patterning the same conductor layer as the floating gate electrode in the periphery of said MIS type memory transistor portion.
申请公布号 US4764479(A) 申请公布日期 1988.08.16
申请号 US19860897391 申请日期 1986.08.15
申请人 HITACHI, LIMITED 发明人 KOSA, YASUNOBU;KOMORI, KAZUHIRO
分类号 H01L27/112;H01L21/28;H01L21/8246;H01L21/8247;H01L27/105;H01L29/49;H01L29/788;H01L29/792;(IPC1-7):H01L29/78 主分类号 H01L27/112
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