| 摘要 |
<p>Deposited on a substrate are prepared by production of an ionised plasma, bombardment of a metallic and a non-metallic target by this plasma and depositing the metallic and non-metallic particles produced, on the substrate in the form of a thin film. The substrate is mounted in the interior of a chamber in which there are also a metal (typically nickel-chrome alloy) and non-metal (typically borosilicate glass) target. An ionisable gas (pref. argon) is introduced into the chamber and ionised by means of radio frequency energy, to form a plasma of positive ions. The non-metallic target is bombarded first the plasma and then the metallic mesh target which is placed between the non-metallic target and the substrate. The amount of metallic and non-metallic deposits and thus the resistivity can be controlled by applying to the non-metallic target a varying radio frequency energy and to the metallic target a varying continuous current. The resistance of the film can be controlled to give a required resistance precisely. Thin film coatings thus obtained are useful in micro-circuits.</p> |
